SEMICON West 2025German Exhibitors scia Systems GmbH

scia Systems GmbH

www.scia-systems.com

About us

scia Systems – From nano to Infinity

Founded in 2013, scia Systems is a technology leader in thin-film process equipment based on advanced ion beam and plasma technologies. The systems are used for coating, etching, and cleaning processes with nanometer resolution and have been successfully implemented in various high-tech industries worldwide, including microelectronics, MEMS, and precision optics industries. More: https://www.scia-systems.com/

Manufacturing in clean room environment

scia Mill 200 - Ion beam system for surface etching with nanometer precision

scia Cluster 200 - The All-in-One Cluster Solution a highly flexible, modular, and scalable thin-film process equipment

Address

scia Systems GmbH
Clemens-Winkler-Str. 6c
09116 Chemnitz
Germany

E-mail: info@scia-systems.com
Phone:  +49 3713 35610
Internet: www.scia-systems.com

Contact person:

Marcel Demmler
Sales director
E-mail: m.demmler@scia-systems.com

Mandy Gebhardt
Head of Marketing
E-mail: m.gebhardt@scia-systems.com

scia Trim Systems - Surface Modification using Ion Beam Trimming for Next-Generation Applications

The scia Trim systems are high-volume production systems for high-precision surface trimming of wafers. They are used to achieve high-quality surface structures without limitations on film and wafer materials. The machine layout is optimized for high throughput and low maintenance.

The scia Trim systems guarantee film thickness homogeneity to an atomic level of 0.1 nm. Unlike conventional mechanical polishing methods, ion beam trimming operates without physical contact. Therefore, it prevents mechanical stress or damage to surrounding areas, increasing the device's reliability.

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scia Trim 200

scia Mill Systems - Full Surface Ion Beam Etching with Nanometer Precision

The scia Mill systems are high-volume production systems that utilize Ion Beam Etching (IBE) for highly precise surface processing of complex multilayer materials. The systems offer excellent surface uniformity for wafer sizes up to 200 mm. Typical applications are 2D and 3D structuring of magnetic memory (MRAM), sensors, MEMS, and compound semiconductors.

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scia Mill 200

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