The LiquiSonic® Semiconductor Sensor from SensoTech enables precise inline concentration monitoring in wet chemical semiconductor processes. Designed for applications such as SC1/APM, SC2/HPM, BOE/BHF, SPM/Piranha, DHF and TMAH-based development processes, the sensor provides real-time concentration data directly from the running process.

In wafer manufacturing, even small deviations in chemical composition can affect cleaning performance, etch rate, selectivity and process stability. LiquiSonic® helps operators maintain tight process windows by continuously monitoring critical bath concentrations without delayed laboratory analysis or manual sampling.

The measurement system is based on ultrasonic velocity measurement combined with automatic temperature compensation. For multi-component systems, additional physical parameters such as conductivity can be integrated to clearly determine individual concentrations. This enables reliable monitoring of complex chemical mixtures used in cleaning, etching and development processes.

The sensor is designed for chemically sensitive semiconductor environments and uses chemically resistant materials such as PFA. With maintenance-free operation, no consumables and common interfaces including 4–20 mA, Profibus, Ethernet, Modbus and fieldbus, LiquiSonic® can be integrated into wet benches, bath systems, circulation loops or supply systems.

By providing continuous and traceable process data, the LiquiSonic® Semiconductor Sensor supports stable wafer processing, early deviation detection, optimized chemical usage and improved quality assurance in semiconductor manufacturing.