SensoTech GmbH
Booth number: 1444-10
www.sensotech.com/
About us
SensoTech provides inline process analysis systems for real-time concentration monitoring in wet chemical semiconductor processes. With LiquiSonic®, chemical concentrations in wafer cleaning, etching and bath applications such as SC1/APM, SC2/HPM, SPM/Piranha, DHF, BOE/BHF and TMAH-based development processes can be monitored continuously and directly in the process.
The system is based on sonic velocity and temperature-compensated measurement and supports stable process control, early detection of concentration deviations and reduced manual sampling. Maintenance-free sensors, chemically resistant materials and common industrial interfaces enable integration into wet benches, cleaning and etching baths, circulation loops or supply systems.
Address
Steinfeldstr. 1
39179 Magdeburg-Barleben
Germany
E-mail: info@sensotech.com
Phone: +49 39203 281100
Internet: www.sensotech.com/
69 Montgomery Street, Unit 13218
NJ 07303 Jersey City
United States
E-mail: sales-usa@sensotech.com
Phone: +1 973 832 4575
Internet: www.sensotech.com/en/
Room 609, Bldg.1, No.778, Jinji Road. Pilot Free Trade Zone
201206 Shanghai
China
E-mail: sales-china@sensotech.com
Phone: +86 21 6485 5861
Internet: www.sensotechchina.com
Contact person:
Daniel Sommerfeldt
Marketing SensoTech GmbH
E-mail: daniel.sommerfeldt@sensotech.com
Anett Dobra
Administrative Assistant Sales US
E-mail: anett.dobra@sensotech.com
Phone: +1 973 832 4575
Products & Services
LiquiSonic® from SensoTech enables real-time inline concentration monitoring in wet chemical semiconductor processes. Designed for applications such as SC1, SC2, BOE/BHF, SPM, DHF and TMAH-based development, the sensor helps maintain stable process windows in wafer cleaning, etching and bath control. Based on ultrasonic velocity measurement and temperature compensation, LiquiSonic® provides precise process data without manual sampling, consumables or regular maintenance.
Ultrasonic sensor for semiconductor wet processes
The LiquiSonic® Semiconductor Sensor from SensoTech enables precise inline concentration monitoring in wet chemical semiconductor processes. Designed for applications such as SC1/APM, SC2/HPM, BOE/BHF, SPM/Piranha, DHF and TMAH-based development processes, the sensor provides real-time concentration data directly from the running process.
In wafer manufacturing, even small deviations in chemical composition can affect cleaning performance, etch rate, selectivity and process stability. LiquiSonic® helps operators maintain tight process windows by continuously monitoring critical bath concentrations without delayed laboratory analysis or manual sampling.
The measurement system is based on ultrasonic velocity measurement combined with automatic temperature compensation. For multi-component systems, additional physical parameters such as conductivity can be integrated to clearly determine individual concentrations. This enables reliable monitoring of complex chemical mixtures used in cleaning, etching and development processes.
The sensor is designed for chemically sensitive semiconductor environments and uses chemically resistant materials such as PFA. With maintenance-free operation, no consumables and common interfaces including 4–20 mA, Profibus, Ethernet, Modbus and fieldbus, LiquiSonic® can be integrated into wet benches, bath systems, circulation loops or supply systems.
By providing continuous and traceable process data, the LiquiSonic® Semiconductor Sensor supports stable wafer processing, early deviation detection, optimized chemical usage and improved quality assurance in semiconductor manufacturing.
