The Vistec SB3050-2 is today’s most advanced Electron Beam Lithography system with Variable Shaped Beam technology and full writing capability on mask or wafer substrates of up to 300 mm dimension.

Effective writing techniques and Variable Shaped Beam electron optics make the simultaneous use of fast exposure and high resolution possible. The Cell Projection function improves throughput and pattern fidelity of repetitive or curvilinear structures. 

Thanks to the production-compatible Graphical User Interface (GUI), the Vistec SB3050-2 can be easily integrated into automated production environments (CIM). Capable of exposing both masks (including templates) and wafers, the SB3050-2 exposure tools are ideal for bridging the gap between next-generation technology nodes.