Vistec Electron Beam develops, manufactures, sells and services electron-beam lithography systems which are based on the Variable Shaped Beam (VSB) technology. The dedicated and tailored data preparation solution ePLACE (licenced by Vistec Electron Beam) ensures a perfect link between design and lithography performance. The portfolio covers electron-beam lithography systems with 200 mm and 300 mm platforms. This high flexibility gives access to a wide range of applications in R&D, prototyping, and small volume production. 

The Vistec VSB systems combine state of the art fully automated substrate handling, adjustment and alignment with a high-precision stage system and a sophisticated electron-optical 50 keV column specifically developed to ensure excellent lithography performance. All Vistec systems featuring exposure strategies as “write-on-the-fly”, vector scan and multi-pass exposure. 

Vistec’s SB254  is a fully automated, high performance, cost-effective electron-beam lithography system designed for use in both industry and advanced research. Based on the Variable Shaped Beam (VSB) principle, these tools are utilized in a wide range of existing and emerging semiconductor and nanotechnology applications including silicon direct write, compound semiconductor, mask making, integrated optics, and silicon photonics.