SEMICON West 2025Products & Services scia Mill Systems - Full Surface Ion Beam Etching with Nanometer Precision
scia Mill Systems - Full Surface Ion Beam Etching with Nanometer Precision
Exhibitor
scia Systems GmbH
The scia Mill systems are high-volume production systems that utilize Ion Beam Etching (IBE) for highly precise surface processing of complex multilayer materials. The systems offer excellent surface uniformity for wafer sizes up to 200 mm. Typical applications are 2D and 3D structuring of magnetic memory (MRAM), sensors, MEMS, and compound semiconductors.
scia Mill 200