SEMICON West 2025Products & Services Vistec SB3050-2
Vistec SB3050-2
Exhibitor
Vistec Electron Beam GmbH
The Vistec SB3050-2 is today’s most advanced Electron Beam Lithography system with Variable Shaped Beam technology and full writing capability on mask or wafer substrates of up to 300 mm dimension.