Vistec Electron Beam GmbH
About us
Vistec Electron Beam GmbH, Jena (Germany) provides leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for industrial and advanced research applications (e.g. semiconductor manufacturing, incl. compound semiconductor, mask writing, photonics).
Efficient data processing & innovative exposure strategies (e.g. Cell Projection) open up new applications (e.g. AR/VR).
Vistec’s technology features automated handling, as well as high flexibility, writing accuracy and productivity and therefore is suitable for prototyping and low volume production.
In addition to its production facility in Germany, Vistec maintains service & support centers in Asia Pacific, USA and Europe.
Address
Ilmstr. 4
07743 Jena
Germany
E-mail: electron-beam@vistec-semi.com
Phone: +49 3641 7998-0
Internet: www.vistec-semi.com
Vistec SB254
The Vistec SB254 electron beam lithography system has been designed as a universal and cost-effective tool for both direct write and mask making applications to allow the customers to react quickly to market demands.
Vistec SB3050-2
The Vistec SB3050-2 is today’s most advanced Electron Beam Lithography system with Variable Shaped Beam technology and full writing capability on mask or wafer substrates of up to 300 mm dimension.
